Adjust the HNO₃ dry deposition

I am using CMAQ v5.3.1 with the M3Dry dry deposition scheme. I would like to modify the dry deposition velocity of gaseous HNO₃ for a sensitivity experiment. May I ask which part of the CCTM source code controls HNO₃ dry deposition and how this can be adjusted?

We recommend upgrading to the latest version of CMAQ v5.5.

Please also search the forum for previous posts about HNO3 dry deposition as they may provide the answer that you need.